LAM 810-073479-003氣體盒模塊 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
LAM 810-073479-003 氣體盒模塊 是一種專為半導(dǎo)體制造設(shè)備設(shè)計(jì)的關(guān)鍵組件，通常用于控制和管理氣體的分配與流動(dòng)。此模塊廣泛應(yīng)用于諸如化學(xué)氣相沉積 (CVD)、物理氣相沉積 (PVD) 和蝕刻等工藝中，為精準(zhǔn)氣體供應(yīng)和高效工藝控制提供保障。
主要特點(diǎn)：
高精度氣體控制：
- 支持多種工業(yè)氣體的精確流量調(diào)節(jié)，確保工藝條件的一致性。
模塊化設(shè)計(jì)：
- 結(jié)構(gòu)緊湊，便于集成到現(xiàn)有設(shè)備中，安裝和維護(hù)簡便。
高耐用性：
- 材質(zhì)優(yōu)選耐腐蝕金屬和高性能密封材料，可承受復(fù)雜的工藝氣體和苛刻的工作環(huán)境。
智能化管理：
- 集成先進(jìn)的傳感和控制技術(shù)，實(shí)現(xiàn)氣體流量、壓力和溫度的實(shí)時(shí)監(jiān)測與反饋。
安全性保障：
- 配備多重安全保護(hù)機(jī)制，防止氣體泄漏或流量異常導(dǎo)致的設(shè)備損壞或工藝失效。
應(yīng)用領(lǐng)域：
半導(dǎo)體制造：
- 應(yīng)用于CVD、PVD、蝕刻和其他需要精確氣體供應(yīng)的工藝步驟。
工業(yè)氣體管理：
- 在高端制造設(shè)備中，用于控制多種氣體的分配與混合。
實(shí)驗(yàn)室和研發(fā)設(shè)備：
- 為復(fù)雜實(shí)驗(yàn)提供精準(zhǔn)且穩(wěn)定的氣體控制支持。
英文資料：
The LAM 810-073479-003 gas box module is a critical component designed specifically for semiconductor manufacturing equipment, typically used to control and manage the distribution and flow of gases. This module is widely used in processes such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and etching, providing assurance for precise gas supply and efficient process control.
Main features:
High precision gas control:
Support precise flow regulation of multiple industrial gases to ensure consistency of process conditions.
Modular design:
Compact structure, easy to integrate into existing equipment, easy to install and maintain.
High durability:
The preferred materials are corrosion-resistant metals and high-performance sealing materials, which can withstand complex process gases and harsh working environments.
Intelligent management:
Integrate advanced sensing and control technologies to achieve real-time monitoring and feedback of gas flow rate, pressure, and temperature.
Security guarantee:
Equipped with multiple safety protection mechanisms to prevent equipment damage or process failure caused by gas leaks or abnormal flow rates.
Application areas:
Semiconductor manufacturing:
Applied to CVD, PVD, etching, and other process steps that require precise gas supply.
Industrial gas management:
Used in high-end manufacturing equipment to control the distribution and mixing of multiple gases.
Laboratory and R&D equipment:
Provide precise and stable gas control support for complex experiments.
2.產(chǎn) 品 展 示
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